Selective Laser Etching and Direct Laser Writing
Features
Laser
- 1030 nm ultrashort pulse NIR, Class 4; M² ~ 1.2
- Pulse duration: ~400 fs–5 ps (software-tunable); motor-controlled fs/ps
- Repetition rate: 100 kHz–10 MHz; ≥8 W at 0.5 MHz; max pulse energy ~16 µJ at 0.5 MHz (10 mm writing in glass)
- Automated power measurement; motorized/software power attenuation; motorized OD filter
Processes & materials
- SLE: fused silica, Borofloat, sapphire; surface roughness ~1 µm (on-the-fly z focus correction)
- DLW/ablation: graphite, ceramics, metal, plastic, optical fiber facets
Positioning (Aerotech 3-axis)
- Travel: 200×200×150 mm³; continuous wafer-level and curved XYZ writing
- XY: repeatability ±100 nm, resolution 3 nm, max speed 400 mm/s
- Z: repeatability ±0.5 µm, precision ±1 µm over 50 mm, resolution 50 nm, max speed 10 mm/s
Scanning
- Galvo at 1030 nm; write speed 200 mm/s; positioning ~700 mm/s (~3 ms); welding ≥15 mm/s
Optics & vision
- 3D microscanner; 20× and 10× objectives; real-time camera with feature recognition; autofocus with writing laser; integrated microscope/camera for in-situ metrology
Sample
- Up to 160×160 mm design, 10 mm thickness; vacuum sample holder; manual load with auto alignment, tilt and rotation compensation via markers
Software & control
- Single GUI; Rhino 3D; slicing/hatching with user path/node control; curved (spline) hatch and contours; import STP, IGES, STL, DXF, DWG, AMF, PLT, FAB, SVG;csv-driven parameter studies
System
- Suction and filter (fume extraction); glass welding module; laser-safe sliding-door casing; manual polarization adjustment module; Thorlabs power meter; passive vibration isolation; CE, Class 1 laser housing