Lightfab 3D Printer

Two-photon polymerization 3D printing, maskless lithography, MEMS components and microfluidic device fabrication in fused silica, as well as metamaterials and photonic crystals

ENG-N22 lightfab

The LightFab 3D Printer is especially designed for our subtractive 3D printing process SLE (e.g. selective laser etching using 40% KOH solution) and is also used for other 3D laser writing processes inside near-infrared transparent materials like waveguide writing, 2-photon-polymerization (515 nm), backside ablation and crack-free markings.

 

The system can be used for fabrication of 3D glass parts with applications such as micro fluidics, micro mechanics, integrated optics and other applications that require high precision. The LightFab 3D Printer is designed for fast automatic 3D printing with the included CAD/CAM software.

 

The smallest feature size typically achievable is roughly 1 um (without SLE), and 10 um with SLE using KOH solution.

 

The LightFab 3D Printer consist of detachable laser safety casing with illumination and a lockable sliding front door to be mounted on a special vibrational isolated table containing a mode locked class IV fs laser centered at 1030 nm; a 3-axis stage consisting of a xy linear stage HLD117NN, a z-stage FB206E and a controller

ProScan III with sample holder;

a 3D micro scanner with hood consisting of a xy-Galvo scanner IntelliScan III 10, a piezo focusing module nanoMIPOS 400, camera with upright LED illumination and optics for use of various micros cope objectives; a power meter beneath the xy-stage, a laser shutter with controller at the beam exit of the fs-laser source.

 

Notes:

Laser parameters factory set e.g. for SLE of fused silica or for 2PP of polymers

Universal sample holder or sample holder for 4 slides 75 x 25 mm

 

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Features

 Laser 

 

 

Femtosecond laser with modulator (Satsuma from Amplitude Systems)

Wavelength 

1030 nm (515 nm doubled)

Beam quality 

1.3 

Power 

4 W 

Repetition rate 

100 kHz – 10 MHz 

Pulse duration 

400 fs – 5 ps 

Pulse energy

4 µJ 

 

3D microscanner

 

Combination of the microscanner (XY galvanometer) and piezo focussing module. 

 

Objective 

40x 

20x 

Scan range 

350 x 350 µm2 

700 x 700 µm2 

Travel range z 

300 µm 

300 µm 

Resolution xyz 

11 nm 

22 nm 

Repeatability xyz 

25 nm 

50 nm 

Writing speed xy 

80 mm/s 

160 mm/s 

Positioning speed xy 

300 mm/s 

600 mm/s 

Positioning time z  

20 ms 

20 ms 

Accessible volume 

120 x 80 x 2 mm3 

120 x 80 x 5 mm3 

Camera (pixels) 

1280 x 1024 monochrome 

 

Objectives 

 

Magnification 

40x 

20x 

NA 

0.6 

0.4 

5 mm 

10 mm 

Working distance 

3.6 mm 

8.2 mm 

 

3-axes linear stepper 

 

Travel range xy  

120 x 80 mm2 

Travel range z  

25 mm 

Resolution xy 

50 nm 

Resolution z 

100 nm 

Repeatability xy 

150 nm 

Repeatability z 

1 µm 

Positioning speed xy 

300 mm/s