Nanoscribe Photonic Professional GT

Two-photon polymerization 3D printing, maskless lithography, MEMS components and device fabrication, as well as metamaterials and photonic crystals

ENG-N6 nanoscribe

Nanoscribe's Photonic Professional GT2 uses Two-Photon Polymerization (2PP) to produce filigree structures of nearly any 3D shape by high-precision 3D printing: crystal lattices, porous scaffolds, naturally inspired patterns, smooth contours, sharp edges, undercuts and bridges are all manufacturable with high resolution.

 

The system is equipped with ultra-fast galvo scanner-based scan head ("GT unit") enabling two write modes:

 

  1. Piezo Mode: Moves glass substrate in 3D with standard 3-axis piezo stage.       
  2. Galvo Mode: Writes structures layer by layer using Galvo scanner at ultra-fast rate.

 

Compatible photosensitive materials: IP photoresist series Nanoscribe, SU8, Ormocomp, AZ9260. Please consult the Nanoscribe knowledge bases for an up-to-date list of compatible photoresists.

 

Software “Nanowrite” and “Describe”.  Capable of importing STL data.

 

Oil immersion objective available for Dip-in Laser Lithography (DiLL) for tall structures up to 200 microns, with potential for 1-mm-tall structures depending on design.

Nanoscribe's Photonic Professional GT2 uses Two-Photon Polymerization (2PP) to produce filigree structures of nearly any 3D shape by high-precision 3D printing: crystal lattices, porous scaffolds, naturally inspired patterns, smooth contours, sharp edges, undercuts and bridges are all manufacturable with high resolution.

 

The system is equipped with ultra-fast galvo scanner-based scan head ("GT unit") enabling two write modes:

 

  1. Piezo Mode: Moves glass substrate in 3D with standard 3-axis piezo stage.       
  2. Galvo Mode: Writes structures layer by layer using Galvo scanner at ultra-fast rate.

 

Compatible photosensitive materials: IP photoresist series Nanoscribe, SU8, Ormocomp, AZ9260. Please consult the Nanoscribe knowledge bases for an up-to-date list of compatible photoresists.

 

Software “Nanowrite” and “Describe”.  Capable of importing STL data.

 

Oil immersion objective available for Dip-in Laser Lithography (DiLL) for tall structures up to 200 microns, with potential for 1-mm-tall structures depending on design.

Reservations & Training
Inventory ID:
ENG-N006
Manufacturer:
Nanoscribe
Model:
Photonic Professional GT
Year Installed:
2016
Section
Engineering
Room Number:
L2 A647
Open to External Use?:
Yes
Operation:
User/Staff Operated
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Features

Laser source and optical system: Femto-second fiber laser 

  • Wavelength:  780 nm ±10 nm 
  • Power: 120 mW 
  • Repitition rate: 80 MHz 

 

Inverted microscope. 

  • Oil immersion objective: 63x, NA=1.4, WD = 190 um. 
  • Camera: 1.4 Mpixel.  

 

Substrate positioning system. 

  • Piezo stage 
  • Number of axis: 3 (XYZ) 
  • Travel range: 300 um per axis 
  • Repeatability: ≥ ± 5 nm 
  • Motorized stage 
  • Number of axis: 2 (XY) 
  • Travel range: 100 mm per axis 
  • Repeatability: ≥ ± 1.5 um 
  • Substrate holders 

 

Consumables 

  • IP-L780  
  • Ip-G780
  • Ip-Dip
  • Cover slips
  • DiLL substrates

 

Objective for writing mesoscale structures 

  • Oil immersion objective: 25x, NA=0.8, WD = 390 um. 

 

Specifications 

 

 

Galvo mode 

Piezo mode 

3D lateral minimum feature sizes 

200 nm 

200 nm 

2D lateral resolution 

500 nm 

500 nm 

Vertical resolution 

1500 nm 

1000 nm 

Lateral write area 

140 x 140 um2 

300 x 300 x 300 um3 

Writing speed (typical) 

10 mm/s 

100 um/s 

Accessible writing area (max) 

100 x 100 mm2 

100 x 100 mm2