Electron Beam Lithography

The Elionix Boden 100 is a high-precision electron beam lithography system designed for direct writing of nanoscale features. It uses a thermal field emitter electron gun to generate a stable electron beam capable of producing extremely fine patterns. This level of control makes the system ideal for research in nanophotonics, quantum devices, nanoelectronics, and advanced materials.

Basically, the system scans the electron beam across a resist-coated substrate in a highly controlled manner, exposing selected areas to define the desired pattern. This direct-write approach eliminates the need for physical masks and is especially valuable when high pattern fidelity, precise alignment, and flexibility are required.

It supports writing on a variety of substrate types and sizes and comes with advanced control software. Design preparation can be carried out on an external PC using BEAMER and TRACER software, allowing complex layout creation and data conversion prior to exposure.