Professor Shintake studies his design for in-line, high-NA EUV lithography

A scientist sits at a desk looking at a computer screen. The screen contains a schematic of a projector design for high NA EUV lithography.

Professor Shintake uses OpTaliX, an optical simulation system, to figure out the precise placement and angles of mirrors for his EUV lithography optical system design.

Date:
16 June 2026
Credit:
Andrew Scott, OIST

Copyright OIST (Okinawa Institute of Science and Technology Graduate University, 沖縄科学技術大学院大学). Creative Commons Attribution 4.0 International License (CC BY 4.0).

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