Thin Film X-ray Diffractometer
A Thin Film X-ray Diffractometer is a precision-engineered instrument designed for the detailed analysis of thin films. It provides information about the structural and crystallographic properties inherent in thin films.
Operating on the principle of X-ray diffraction, the instrument directs X-rays onto the thin film material, recording and analysing the resulting diffraction patterns. This process allows for determining crystallographic parameters, including lattice spacing, grain orientation, and crystal structure.
* Applications: Thin film XRD, micro-XRD, XRR (X-ray reflectivity), GIXRD (Grazing Incidence XRD), HRXRD (High-Resolution XRD), Texture, Residual Stress, Phase identification, Temperature-dependent XRD.
Features
Specifications
1. X-ray generator and X-ray tube: Water-cooling metal-ceramic X-ray tube (Cu Source) and generator (Max. 3kW)
2. Goniometer: High-precision two-circle goniometer with independent stepper 2θ movement
3. Sample stage: Eulerian cradle sample stage with Vacuum chuck stage and High-temperature dome stage (DHS 1100, Anton Paar) with a temperature range (25 °C – 1100 °C)
4. Primary optics: Goebel mirror, Ge022 monochromator
5. Secondary optics: Equatorial soller, Variable slit, Crystal 1B
6. Detector: Pathfinder (0D), Vantec-1 (1D) and Vantec 500 (2D)
